• Performance     
  1) Resolution     
 For High Resolution condition : 1.2nm guaranteed at 30 kV or better   
                                        2.0nm guaranteed at 1 kV or better  
 For analytical condition:   3.0nm guaranteed at 15 kV, WD 10mm, 5nA or better  
 Gentle beam Mode:   Built-in  
   2) Magnification :   x10 to x1,000,000 or wider  
       Magnification preset :   User can be switch instantaneously from any magnification to any preset magnification.  
   3) Image modes :   SEI, BEI   
• Electron Optical System     
   1) Accelerating voltage :   0.2 to 30 kV or berrer  
   2) Electron Gun:   ZrO/W(100)Shottky type Filament Built-in  
   3) Gun Bias   Auto and Manual mode.  
   4) Probe current :   Up to 2 x 10-7A at 15kV or better  
   5) Alignment :   Mechanical and electromagnetic deflection(Mechanical alignment by user can not be required)

전처리비용(CP사용) - 30,000원/시간

SEI 분석 - 50,000원/시간

EDS분석 - 50,000원/시간

EBSD분석 - 200,000원/시간